Double Pulse Voltammetry

Technology #2010-333

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Kendall H. Lee M.D., Ph.D.
Inyong Kim
Dong-Pyo Jang
Managed By
Tim D. Argo
Patent Protection
US Patent Pending

A major problem in the area of electrochemistry and fast scan cyclic voltammetry is the occurrence of multiple complex analytes being measured by the fast scan cyclic voltammetry. In this invention, we developed the technique of Double Pulse Voltammetry (DPV) in which very fast scan cyclic voltammetry can be done at various voltages in this case from -0.4 volt to +1.5 volt and back down again to -0.4 volt at 400 volts per second but in line with this. A second pulse can be delivered as early as a few msec following the first pulse, delivering the exact same or even variable rate of voltammetry.